Sergio Edelstein
20Patents
13h-index
53Co-inventors
80Inventor score
Filing activity: Jan 31, 1995 → Jun 5, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5796074A | Wafer heater assembly | Chemistry; Metallurgy | 565 | Expired |
| US6603269B1 | Resonant chamber applicator for remote plasma source | Electricity | 238 | Expired |
| US7893703B2 | Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer | Electricity | 103 | Active |
| US6350353B2 | Alternate steps of IMP and sputtering process to improve sidewall coverage | Electricity | 100 | Expired |
| US5691876A | High temperature polyimide electrostatic chuck | Electricity | 44 | Expired |
| US7369233B2 | Optical system for measuring samples using short wavelength radiation | Physics | 38 | Expired |
| US6290865A | Spin-rinse-drying process for electroplated semiconductor wafers | Emerging Cross-Sectional Technologies | 37 | Expired |
| US6368469B1 | Coils for generating a plasma and for sputtering | Electricity | 28 | Expired |
| US5650052A | Variable cell size collimator | Electricity | 26 | Expired |
| US5908334A | Electrical connector for power transmission in an electrostatic chuck | Electricity | 26 | Expired |
| US6254746A | Recessed coil for generating a plasma | Electricity | 25 | Expired |
| US7248062B1 | Contactless charge measurement of product wafers and control of corona generation and deposition | Electricity | 20 | Expired |
| US6254737A | Active shield for generating a plasma for sputtering | Electricity | 13 | Expired |
| US6783639B2 | Coils for generating a plasma and for sputtering | Electricity | 12 | Expired |
| US9710903B2 | System and method for detecting design and process defects on a wafer using process monitoring features | Electricity | 6 | Active |
| US7719294B1 | Systems configured to perform a non-contact method for determining a property of a specimen | Electricity | 5 | Active |
| US8398832B2 | Coils for generating a plasma and for sputtering | Electricity | 5 | Active |
| US7538333B1 | Contactless charge measurement of product wafers and control of corona generation and deposition | Electricity | 2 | Active |
| US7345306B1 | Corona based charge voltage measurement | Physics | 0 | Active |
| US7098050B1 | Corona based charge voltage measurement | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.