Recessed coil for generating a plasma
US6254746A · kind A · utility
25Cited by
58References
60Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 8, 1997 |
| Grant date | Jul 3, 2001 |
| Priority date | — |
| Expiry date | May 8, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A recessed coil for a plasma chamber in a semiconductor fabrication system is provided. Recessing the coil reduces deposition of material onto the coil which in turn leads to a reduction in particulate matter shed by the coil onto the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.