Clog resistant gas delivery system
US6261374A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1998 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Sep 29, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4485
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention recognizes that reactions between processing liquids is a major source of residue which clogs gas delivery systems. To avoid reactions between or among vaporized processing liquids, an inventive gas delivery system provides parallel delivery of vaporized processing liquids. The gas delivery system may be configured using any conventional vaporizing mechanism such as bubblers or injection valves. Preferably, liquid precursors TEPO, TEOS and TEB are vaporized in parallel within three injection valves, the vaporized processing liquids then are flowed into a common line and delivered to a chemical vapor deposition chamber for processing semiconductor wafers. In the unlikely event the line becomes clogged, the line can be easily replaced. Most preferably a single source of carrier gas controlled by a single mass flow controller supplies carrier gas to all three injection valves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.