Surface cleaning apparatus and method
US6273100A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1998 |
| Grant date | Aug 14, 2001 |
| Priority date | — |
| Expiry date | Aug 27, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Apparatuses and methods are disclosed for submerged cleaning of substrates and the like. The apparatus includes a container holding a bath of cleaning fluid and, within the container, the combination of a submerged brush scrubber, submerged megasonic transducer and Marangoni drying devices. In operation, at least a portion of a substrate is submerged in the bath of cleaning fluid where its surfaces are contacted by one or more brush scrubbers while beams produced by megasonic transducers are directed parallel to the surface of the substrate along the surface of the substrate. The substrate is removed from the bath of cleaning fluid and rinsed with rinse water. A Marangoni flow is induced on the surface of the substrate and the substrate is allowed to dry through one or more means of drying, thereby rendering the substrate free from particulate contamination and dried of any residual fluid from the cleaning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.