Michael T. Andreas
45Patents
14h-index
10Co-inventors
78Inventor score
Filing activity: Oct 3, 1996 → Feb 5, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5895550A | Ultrasonic processing of chemical mechanical polishing slurries | Emerging Cross-Sectional Technologies | 102 | Expired |
| US5855811A | Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication | Emerging Cross-Sectional Technologies | 77 | Expired |
| US6124207A | Slurries for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods and apparatuses for making and using such slurries | Performing Operations; Transporting | 69 | Expired |
| US6265781A | Methods and solutions for cleaning polished aluminum-containing layers, methods for making metallization structures, and the structures resulting from these methods | Electricity | 57 | Expired |
| US6044851A | Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication | Emerging Cross-Sectional Technologies | 49 | Expired |
| US6358325B1 | Polysilicon-silicon dioxide cleaning process performed in an integrated cleaner with scrubber | Emerging Cross-Sectional Technologies | 37 | Expired |
| US6077785A | Ultrasonic processing of chemical mechanical polishing slurries | Emerging Cross-Sectional Technologies | 32 | Expired |
| US5963814A | Method of forming recessed container cells by wet etching conductive layer and dissimilar layer formed over conductive layer | Electricity | 30 | Expired |
| US6375548B1 | Chemical-mechanical polishing methods | Electricity | 22 | Expired |
| US6269511A | Surface cleaning apparatus | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6787473B2 | Post-planarization clean-up | Emerging Cross-Sectional Technologies | 19 | Expired |
| US6468951B1 | Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6273100A | Surface cleaning apparatus and method | Emerging Cross-Sectional Technologies | 18 | Expired |
| US9653307B1 | Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures | Electricity | 17 | Active |
| US6589882B2 | Copper post-etch cleaning process | Electricity | 10 | Expired |
| US6399492B1 | Ruthenium silicide processing methods | Electricity | 10 | Expired |
| US6635562B2 | Methods and solutions for cleaning polished aluminum-containing layers | Chemistry; Metallurgy | 8 | Expired |
| US7235494B2 | CMP cleaning composition with microbial inhibitor | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6936540B2 | Method of polishing a semiconductor substrate, post-CMP cleaning process, and method of cleaning residue from registration alignment markings | Electricity | 6 | Expired |
| US6835668B2 | Copper post-etch cleaning process | Electricity | 6 | Expired |
| US7468105B2 | CMP cleaning composition with microbial inhibitor | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7033978B2 | Post-planarization clean-up | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6835121B2 | Chemical-mechanical polishing methods | Electricity | 4 | Expired |
| US6627550B2 | Post-planarization clean-up | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6930017B2 | Wafer Cleaning method and resulting wafer | Emerging Cross-Sectional Technologies | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.