Gas supply system equipped with pressure-type flow rate control unit
US6289923A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jun 2, 2000 |
| Grant date | Sep 18, 2001 |
| Priority date | — |
| Expiry date | Jun 2, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/7761
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, and to raise the flow rate control accuracy and reliability of facilities. That eliminates non-uniformity of products or semiconductors and raises the production efficiency. The gas supply system equipped with a pressure-type flow rate control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream side pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculati…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.