Chemically amplified positive photoresists
US6300035A · kind A · utility
15Cited by
10References
20Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 4, 1998 |
| Grant date | Oct 9, 2001 |
| Priority date | — |
| Expiry date | Aug 4, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photoresist compositions are provided comprising 1) a resin binder having photoacid-labile groups, 2) an acid generator and 3) a photospeed control agent. Photoresists of the invention exhibit good photospeed and can provide highly resolved relief images of small dimensions, including lines of sub-micron and sub-half micron dimensions with at least essentially vertical side walls. Methods are also provided that include control of photospeed of a photoresist composition of the invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.