Chuck having pressurized zones of heat transfer gas

US6320736A · kind A · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Shamouil Shamouilian · San Jose, US
• Arnold Kholodenko · San Francisco, US
• Siamak Salimian · Sunnyvale, US
• Hamid Noorbakhsh · Fremont, US
• Efrain Quiles · San Lorenzo, US
• Dennis S. Grimard · Ann Arbor, US

Key dates

• Filing date: May 17, 1999
• Grant date: Nov 20, 2001
• Expiry date: May 17, 2019

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4586
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A chuck 28 for holding a substrate 4 comprises a surface 27 capable of receiving the substrate 4, the surface 27 having a gas inlet port 40 and a gas exhaust port 42. A non-sealing protrusion is between the gas inlet port 40 and the gas exhaust port 42. The non-sealing protrusion 44 impedes the flow of heat transfer gas between the gas inlet port 40 and the gas exhaust port 42 without blocking the flow of heat transfer gas. Preferably, a sealing protrusion 46 is provided around the periphery of the chuck 28 to form a substantially gas-tight seal with the substrate 4 to enclose and prevent leakage of heat transfer gas into a surrounding chamber 6.