Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing
US6354241B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 1999 |
| Grant date | Mar 12, 2002 |
| Priority date | — |
| Expiry date | Jul 15, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D51/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus and method for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor-processing device. The apparatus includes a vessel chamber having an inlet, an outlet and a fluid conduit between the two that fluidly couples the outlet with the inlet. The fluid conduit includes first and second collection sections. The first collection section includes a first plurality of electrodes aligned parallel to a first plane and the second collection section includes a second plurality of electrodes aligned parallel to a second plane that is substantially perpendicular to the first plane. The electrodes are connected to a voltage differential to form an electrostatic particle collector that traps electrically charged particles and particulate matter flowing through the fluid conduit. Particles are collected on the electrodes within the fluid conduit during substrate processing operations such as CVD deposition steps. Then, during a chamber clean operation, unreacted etchant gases used to clean the substrate processing chamber are exhausted through the foreline and into the apparatus of the present invention where they react with the collected pa…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.