Patent · US Expired

Method for unreacted precursor conversion and effluent removal

US6402806B1 · kind B1 · utility

395Cited by
12References
34Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 30, 2000
Grant dateJun 11, 2002
Priority date
Expiry dateJun 30, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32834
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A hot trap converts unreacted organic metal-film precursor from the exhaust stream of a CVD process. The converted precursor forms a metal film on the surface of the hot trap, thereby protecting hot vacuum pump surfaces from metal build up. A cold trap downstream from the hot trap freezes effluents from the exhaust stream. The metal captured by the hot trap and the effluents captured by the cold trap may then be recycled, rather than being released as environmental emissions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.