Apparatus for automatically cleaning resist nozzle
US6418946B1 · kind B1 · utility
5Cited by
15References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 5, 2001 |
| Grant date | Jul 16, 2002 |
| Priority date | — |
| Expiry date | Jan 5, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.