Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
US6432259B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 14, 1999 |
| Grant date | Aug 13, 2002 |
| Priority date | — |
| Expiry date | Dec 14, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor embodying the invention includes a wafer support and a chamber enclosure member having an interior surface generally facing the wafer support. At least one miniature gas distribution plate for introducing a process gas into the reactor is supported on the chamber enclosure member and has an outlet surface which is a fraction of the area of the interior surface of said wafer support. A coolant system maintains the chamber enclosure member at a low temperature, and the miniature gas distribution plate is at least partially thermally insulated from the chamber enclosure member so that it is maintained at a higher temperature by plasma heating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.