Electron beam flood exposure technique to reduce the carbon contamination
US6444381B1 · kind B1 · utility
4Cited by
1References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2000 |
| Grant date | Sep 3, 2002 |
| Priority date | — |
| Expiry date | Dec 4, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
One aspect of the present invention relates to a method for reducing carbon contamination on a mask involving placing a mask plate having carbon-containing contaminants thereon in a processing chamber; simultaneously contacting the mask plate with oxygen and exposing the mask plate with a flood exposure of electron beams wherein the carbon-containing contaminants are converted to a by-product; and removing the by-product from the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.