Ester compounds, polymers, resist composition and patterning process
US6444396B1 · kind B1 · utility
14Cited by
9References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 2, 2000 |
| Grant date | Sep 3, 2002 |
| Priority date | — |
| Expiry date | Sep 29, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.