Acid-decomposable ester compound suitable for use in resist material
US6448420B1 · kind B1 · utility
109Cited by
2References
5Claims
0Family size
Assignee
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Key dates
| Filing date | May 18, 2000 |
| Grant date | Sep 10, 2002 |
| Priority date | — |
| Expiry date | May 18, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester as the acid-decomposable site is used as a dissolution regulator to formulate a resist composition having a high sensitivity, resolution, etching resistance and storage stability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.