Process for depositing a film on a nanometer structure
US6451375B1 · kind B1 · utility
14Cited by
10References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 5, 2001 |
| Grant date | Sep 17, 2002 |
| Priority date | — |
| Expiry date | Jan 5, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2401/90
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process of depositing a thin film on a nanometer structure in which a coating, which may be an aerogel material or metallic seed layer, is prepared. The coating is combined with a supercritical composition to form a supercritical coating composition. The supercritical coating composition is deposited upon a nanometer structure under supercritical conditions. Supercritical conditions are removed whereby the supercritical composition is removed and the coating solidifies into a thin solid film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.