Process of cleaning semiconductor processing, handling and manufacturing equipment
US6454869B1 · kind B1 · utility
9Cited by
6References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2001 |
| Grant date | Sep 24, 2002 |
| Priority date | — |
| Expiry date | Jul 27, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.