Apparatus and method for improving film uniformity in a physical vapor deposition system
US6471831B2 · kind B2 · utility
8Cited by
16References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2001 |
| Grant date | Oct 29, 2002 |
| Priority date | — |
| Expiry date | Jan 9, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A PVD system comprises a hollow cathode magnetron with a downstream plasma control mechanism. The magnetron has a hollow cathode with a non-planar target and at least one electromagnetic coil to generate and maintain a plasma within the cathode. The magnetron also has an anode located between the cathode and a downstream plasma control mechanism. The control mechanism comprises a first, second and third electromagnetic coil beneath a mouth of the target, vertically spaced so as to form a tapered magnetic convergent lens between the target mouth and a pedestal of the magnetron.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.