Method and apparatus for observing or processing and analyzing using a charged beam
US6476387B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 1999 |
| Grant date | Nov 5, 2002 |
| Priority date | — |
| Expiry date | May 14, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2482
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a method for observing or processing and analyzing the surface of a sample by irradiating a charged beam on the sample covered at least partially by an insulator film, an ultraviolet light is irradiated possibly as pulse on the sample (substrate), thereby transforming the insulator into a conductive material due to the photoconductivity effect, thereby transforming the surface of the sample (substrate) into a conductive material, so that charged particles are grounded from a grounded portion in order to prevent the charged beam from being repulsed due to charged particles of the irradiated charged beam accumulated in the insulator formed on the surface of the sample (substrate).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.