Charged particle beam exposure system and method
US6486479B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 7, 2000 |
| Grant date | Nov 26, 2002 |
| Priority date | — |
| Expiry date | Jun 7, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31762
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam exposure method including the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device; and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.