Apparatus for distributing gases in a chemical vapor deposition system

US6495233B1 · kind B1 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Inna Shmurun · Foster City, US
• Scott A. Hendrickson · Brentwood, US
• Gwendolyn D. Jones · Sunnyvale, US
• Shankar Venkataraman · Santa Clara, US
• Son T. Nguyen · San Jose, US
• I-Chun Liu

Key dates

• Filing date: Jul 5, 2000
• Grant date: Dec 17, 2002
• Expiry date: Oct 2, 2020

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/218
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A lid assembly for a semiconductor processing apparatus having at least two chambers comprises a lid plate having a first side and a second side and a plasma generation source mounted to the first side of the lid plate. Additionally, at least two gas boxes are coupled to the first side of the lid of the lid plate, and a divider is coupled between the plasma generation source and the at least two gas boxes.