Scott A. Hendrickson
20Patents
10h-index
39Co-inventors
71Inventor score
Filing activity: Feb 4, 1999 → Jun 16, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6374831B1 | Accelerated plasma clean | Emerging Cross-Sectional Technologies | 562 | Expired |
| US7566891B2 | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors | Performing Operations; Transporting | 523 | Active |
| US7692171B2 | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors | Physics | 451 | Active |
| US6495233B1 | Apparatus for distributing gases in a chemical vapor deposition system | Emerging Cross-Sectional Technologies | 41 | Expired |
| US8203126B2 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Electricity | 26 | Active |
| US6300255A | Method and apparatus for processing semiconductive wafers | Chemistry; Metallurgy | 25 | Expired |
| US7663121B2 | High efficiency UV curing system | Electricity | 23 | Active |
| US6443435B1 | Vaporization of precursors at point of use | Emerging Cross-Sectional Technologies | 20 | Expired |
| US7777198B2 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Electricity | 19 | Active |
| US6814087B2 | Accelerated plasma clean | Emerging Cross-Sectional Technologies | 15 | Expired |
| US7506654B2 | Accelerated plasma clean | Emerging Cross-Sectional Technologies | 9 | Expired |
| US8753449B2 | Enhancement in UV curing efficiency using oxygen-doped purge for ultra low-K dielectric film | Electricity | 9 | Active |
| US8657961B2 | Method for UV based silylation chamber clean | Electricity | 5 | Active |
| US9364871B2 | Method and hardware for cleaning UV chambers | Chemistry; Metallurgy | 4 | Active |
| US8309421B2 | Dual-bulb lamphead control methodology | Electricity | 4 | Active |
| US8841629B2 | Microwave excursion detection for semiconductor processing | Electricity | 3 | Active |
| US9506145B2 | Method and hardware for cleaning UV chambers | Chemistry; Metallurgy | 3 | Active |
| US10570517B2 | Apparatus and method for UV treatment, chemical treatment, and deposition | Chemistry; Metallurgy | 2 | Active |
| US6311959A | Method and apparatus for generating controlled mixture of organic vapor and inert gas | Chemistry; Metallurgy | 1 | Expired |
| US8343881B2 | Silicon dioxide layer deposited with BDEAS | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.