Mechanisms for making and inspecting reticles
US6529621B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 1998 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Dec 17, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reusable circuit design for use with electronic design automation EDA tools in designing integrated circuits is disclosed, as well as reticle inspection and fabrication methods that are based on such reusable circuit design. The reusable circuit design is stored on a computer readable medium and contains an electronic representation of a layout pattern for at least one layer of the circuit design on an integrated circuit. The layout pattern includes a flagged critical region which corresponds to a critical region on a reticle or integrated circuit that is susceptible to special inspection or fabrication procedures. In one aspect of the reusable circuit design, the special analysis is performed during one from a group consisting of reticle inspection, reticle production, integrated circuit fabrication, and fabricated integrated circuit inspection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.