Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
US6533910B2 · kind B2 · utility
30Cited by
41References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2000 |
| Grant date | Mar 18, 2003 |
| Priority date | — |
| Expiry date | Dec 29, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0218
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a carbonitride containing surface and process for manufacture thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.