Patent · US Expired

Method and apparatus for transferring and supporting a substrate

US6537011B1 · kind B1 · utility

33Cited by
25References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 31, 2000
Grant dateMar 25, 2003
Priority date
Expiry dateJul 31, 2020

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/141
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method and apparatus for supporting and transferring a substrate in a semiconductor wafer processing system. In one aspect, a support ring having one or more substrate support members mounted thereon and defining a central opening therein for receipt of a substrate support member during processing is disclosed. In another aspect, a substrate handler blade having a plurality of substrate supports disposed thereon is provided which is adapted to support a substrate thereon and effectuate substrate transfer between the substrate handler blade and the support ring.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.