ArF laser with low pulse energy and high rep rate
US6553049B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 1999 |
| Grant date | Apr 22, 2003 |
| Priority date | — |
| Expiry date | Nov 30, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/1392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reliable modular production quality ArF excimer laser capable of producing laser pulses at repetition rates in the range of 3,000 to 4,000 Hz or greater with pulse energies in the range of about 2 mJ to 5 mJ or greater with a full width half, maximum bandwidth of about 0.4 pm or less and dose stability of less than 0.4 percent. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.10 &mgr;m (100 nm) or less. Replaceable modules include a laser chamber; a modular pulse power system; and a line narrowing module. For a given laser power output, the higher repetition rate provides two important advantages. The lower per pulse energy means less optical damage and the larger number of pulses for a specified illumination dose means better dose stability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.