Method of and apparatus for cleaning substrate
US6558478B1 · kind B1 · utility
26Cited by
8References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2000 |
| Grant date | May 6, 2003 |
| Priority date | — |
| Expiry date | Oct 22, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An acid solution is continuously supplied to a central portion of a surface of a substrate while the substrate is rotating, and an oxidizing agent solution is continuously or intermittently supplied to a periphery of the substrate. In addition, an oxidizing agent solution and an acid solution are simultaneously or alternately supplied to a reverse side of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.