Dual collimated deposition apparatus and method of use
US6572744B1 · kind B1 · utility
8Cited by
13References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2001 |
| Grant date | Jun 3, 2003 |
| Priority date | — |
| Expiry date | Jan 22, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A dual collimation deposition apparatus and method are disclosed in which the dual collimation apparatus includes at least a long-throw collimator in combination with one or more physical collimators. A new physical collimator and shield design are also disclosed for improved process uniformity and increased equipment productivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.