Structure for lithographic focus control features
US6577406B2 · kind B2 · utility
6Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2002 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Jan 17, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A control target structure and method for monitoring the lithographic affects on minimum feature in a lithographic process. The control target uses line array elements having a nominal width. By changing the shape of the line-ends of the elements the control target can be optimized for controlling either focus or dose.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.