Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron
US6613199B1 · kind B1 · utility
28Cited by
10References
16Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 25, 2001 |
| Grant date | Sep 2, 2003 |
| Priority date | — |
| Expiry date | Nov 9, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A hollow cathode magnetron comprises an open top target within a hollow cathode. The open top target can be biased to a negative potential so as to form an electric field within the cathode to generate a plasma. The magnetron uses at least one electromagnetic coil to shape and maintain a density of the plasma within the cathode. The magnetron also has an anode located beneath the cathode. The open top target can have one of several different geometries including flat annular, conical and cylindrical, etc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.