Pellicle for use in EUV lithography and a method of making such a pellicle
US6623893B1 · kind B1 · utility
43Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 26, 2001 |
| Grant date | Sep 23, 2003 |
| Priority date | — |
| Expiry date | May 25, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/24
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A pellicle utilizes a film attached to a barrier layer above a substrate. The film is relatively transparent to radiation in the EUV range. The substrate and barrier layer are coupled to a periphery of the film and is exclusive of the center portion of the film. The pellicle can be manufactured by growing a relatively transparent film on a barrier layer that is grown on a substrate. The substrate and barrier layer are etched to expose a portion of the relatively transparent film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.