Method of and system for improving stability of photomasks
US6627355B2 · kind B2 · utility
8Cited by
10References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2000 |
| Grant date | Sep 30, 2003 |
| Priority date | — |
| Expiry date | Apr 23, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/46
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method of and system for reducing the absorption of light by opaque material in a photomask. The method includes providing a photomask substrate, and applying an opaque material to one side of the photomask substrate. The interface between the opaque material and photomask substrate reflects at least 80 percent of the light through the photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.