Shutter disk and blade alignment sensor
US6669829B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2002 |
| Grant date | Dec 30, 2003 |
| Priority date | — |
| Expiry date | Feb 20, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/566
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.