Cyclical deposition of a variable content titanium silicon nitride layer

US6720027B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Michael Yang · Fremont, US
• Ming Xi · Palo Alto, US

Key dates

• Filing date: Apr 8, 2002
• Grant date: Apr 13, 2004
• Expiry date: Apr 23, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/265
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments of the invention relate to an apparatus and method of depositing a titanium silicon nitride layer by cyclical deposition. In one aspect, a titanium silicon nitride layer having a variable content or a controlled composition of titanium, silicon, and nitrogen through the depth of the layer may be formed. One embodiment of this variable content titanium silicon nitride layer or tuned titanium silicon nitride layer includes a bottom sub-layer of TiSiX1NY1, a middle sub-layer of TiSiX2NY2, and a top sub-layer of TiSiX3NY3 in which X1 is less than X2 and X3 is less than X2. Another embodiment of a variable content titanium silicon nitride layer includes a bottom sub-layer of TiSiX1NY1 and a top sub-layer of TiSiX2NY2 in which X2 is greater than X1. Still another embodiment of a variable content titanium silicon nitride layer includes a bottom sub-layer of TiSiX1NY1, a middle sub-layer of TiSiX2NY2, and a top sub-layer of TiSiX3NY3 in which X1 is greater than X2 and X3 is greater than X2.