Engineered metal gate electrode
US6727560B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2003 |
| Grant date | Apr 27, 2004 |
| Priority date | — |
| Expiry date | Feb 10, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/667
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A metal gate electrode is formed with an intrinsic electric field to modify its work function and the threshold voltage of the transistor. Embodiments include forming an opening in a dielectric layer by removing a removable gate, depositing one or more layers of tantalum nitride such that the nitrogen content increases from the bottom of the layer adjacent the gate dielectric layer upwardly. Other embodiments include forming the intrinsic electric field to control the work function by doping one or more metal layers and forming metal alloys. Embodiments further include the use of barrier layers when forming metal gate electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.