Valve control system for atomic layer deposition chamber

US6734020B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Siqing Lu · Sunnyvale, US
• Yu-Chia Chang · Fremont, US
• Dongxi Sun · Cupertino, US
• Vinh Dang · San Jose, US
• Michael Yang · Fremont, US
• Anzhong Chang · San Jose, US
• Anh N. Nguyen · Milpitas, US
• Ming Xi · Palo Alto, US

Key dates

• Filing date: Mar 7, 2001
• Grant date: May 11, 2004
• Expiry date: Mar 22, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T436/12
• WIPO field: Control
• WIPO sector: Instruments

Abstract

A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.