Method of and apparatus for cleaning substrate
US6745784B2 · kind B2 · utility
6Cited by
10References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2003 |
| Grant date | Jun 8, 2004 |
| Priority date | — |
| Expiry date | Mar 19, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus continuously supplies an acid solution to a central portion of a surface of a substrate while the substrate is rotating, and also supplies an oxidizing agent solution continuously or intermittently to a periphery of the substrate. In addition, the apparatus supplies an oxidizing agent solution and an acid solution either simultaneously or alternately to a reverse side of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.