Automated electrode replacement apparatus for a plasma processing system
US6753498B2 · kind B2 · utility
20Cited by
6References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2003 |
| Grant date | Jun 22, 2004 |
| Priority date | — |
| Expiry date | Jun 14, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32605
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152′) that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.