Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers

US6759184B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Jörg Rottstegge · Erlangen, DE
• Christian Eschbaumer · Arnstorf, DE
• Christoph Hohle · Bubenreuth, DE
• Waltraud Herbst · Uttenreuth, DE
• Michael Sebald · Waischenfeld, DE

Key dates

• Filing date: Jun 28, 2002
• Grant date: Jul 6, 2004
• Expiry date: Oct 23, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/126
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A process for the post-exposure amplification of resist structures uses amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers. In the first step, a fluorine-containing resist is applied to a substrate. After exposure and development of the resist, bonding of an amplification agent chemically amplifies the resist structures. A fluorine-containing amplification agent is preferably used to achieve an improved reaction between polymer and amplification agent due to the improved miscibility of the molecular chains.