Waltraud Herbst
8Patents
3h-index
10Co-inventors
46Inventor score
Filing activity: Oct 15, 1998 → Oct 28, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6893972B2 | Process for sidewall amplification of resist structures and for the production of structures having reduced structure size | Electricity | 192 | Expired |
| US6582888B1 | Method for producing organic electroluminescent components | Electricity | 25 | Expired |
| US6770423B2 | Negative resist process with simultaneous development and silylation | Physics | 3 | Expired |
| US7052820B2 | Silicon-containing resist for photolithography | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7078709B2 | Apparatus and method for proof of outgassing products | Physics | 2 | Expired |
| US6759184B2 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7018784B2 | Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity | Physics | 0 | Expired |
| US7033740B2 | Photoresists with reaction anchors for chemical consolidation of resist structures for exposures at 157 nm | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.