Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers
US6776873B1 · kind B1 · utility
86Cited by
13References
6Claims
0Family size
Inventors
Key dates
| Filing date | Feb 14, 2002 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | Feb 14, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4404
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
To further enhance the chamber material performance of anodized aluminum alloy materials against fluorine and oxygen plasma attack, a ceramic-based surface coating, high purity yttrium oxide coating, is provided on the anodized aluminum alloy parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.