Clifford Stow
13Patents
10h-index
12Co-inventors
61Inventor score
Filing activity: Dec 21, 2001 → Aug 24, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6776873B1 | Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers | Chemistry; Metallurgy | 86 | Expired |
| US6565984B1 | Clean aluminum alloy for semiconductor processing equipment | Emerging Cross-Sectional Technologies | 41 | Expired |
| US6902628B2 | Method of cleaning a coated process chamber component | Emerging Cross-Sectional Technologies | 20 | Expired |
| US7910218B2 | Cleaning and refurbishing chamber components having metal coatings | Emerging Cross-Sectional Technologies | 17 | Active |
| US6713188B2 | Clean aluminum alloy for semiconductor processing equipment | Emerging Cross-Sectional Technologies | 15 | Expired |
| US7579067B2 | Process chamber component with layered coating and method | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6659331B2 | Plasma-resistant, welded aluminum structures for use in semiconductor apparatus | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6899798B2 | Reusable ceramic-comprising component which includes a scrificial surface layer | Performing Operations; Transporting | 12 | Expired |
| US8021743B2 | Process chamber component with layered coating and method | Emerging Cross-Sectional Technologies | 10 | Active |
| US7048814B2 | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus | Chemistry; Metallurgy | 10 | Expired |
| US6656535B2 | Method of fabricating a coated process chamber component | Chemistry; Metallurgy | 5 | Expired |
| US7055732B2 | Semiconductor processing apparatus including plasma-resistant, welded aluminum structures | Emerging Cross-Sectional Technologies | 4 | Expired |
| US7033447B2 | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus | Chemistry; Metallurgy | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.