Inventor · Pleasanton, CA, US

Robert Wu

28Patents
20h-index
61Co-inventors
84Inventor score

Filing activity: Apr 25, 1990 → Mar 21, 2007

Most-cited inventions

PatentTitleAreaCited byStatus
US6074512A Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners Electricity 189 Expired
US5605637A Adjustable dc bias control in a plasma reactor Electricity 147 Expired
US6308654A Inductively coupled parallel-plate plasma reactor with a conical dome Electricity 146 Expired
US5891350A Adjusting DC bias voltage in plasma chambers Electricity 96 Expired
US6776873B1 Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers Chemistry; Metallurgy 86 Expired
US5904778A Silicon carbide composite article particularly useful for plasma reactors Emerging Cross-Sectional Technologies 85 Expired
US5110712A Incorporation of dielectric layers in a semiconductor Electricity 80 Expired
US6074959A Method manifesting a wide process window and using hexafluoropropane or other hydrofluoropropanes to selectively etch oxide Electricity 74 Expired
US6009830A Independent gas feeds in a plasma reactor Electricity 70 Expired
US5176790A Process for forming a via in an integrated circuit structure by etching through an insulation layer while inhibiting sputtering of underlying metal Electricity 67 Expired
US5514247A Process for plasma etching of vias Electricity 59 Expired
US5607542A Inductively enhanced reactive ion etching Electricity 51 Expired
US5910221A Bonded silicon carbide parts in a plasma reactor Emerging Cross-Sectional Technologies 34 Expired
US5560780A Protective coating for dielectric material on wafer support used in integrated circuit processing apparatus and method of forming same Electricity 34 Expired
US5585012A Self-cleaning polymer-free top electrode for parallel electrode etch operation Emerging Cross-Sectional Technologies 33 Expired
US5865937A Broad-band adjustable power ratio phase-inverting plasma reactor Electricity 33 Expired
US6183655A Tunable process for selectively etching oxide using fluoropropylene and a hydrofluorocarbon Electricity 33 Expired
US5965463A Silane etching process Electricity 29 Expired
US5729423A Puncture resistant electrostatic chuck Emerging Cross-Sectional Technologies 26 Expired
US5986875A Puncture resistant electrostatic chuck Emerging Cross-Sectional Technologies 20 Expired
US6454898B1 Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners Electricity 17 Expired
US6221782A Adjusting DC bias voltage in plasma chamber Electricity 17 Expired
US6379574B1 Integrated post-etch treatment for a dielectric etch process Electricity 15 Expired
US6432318B1 Dielectric etch process reducing striations and maintaining critical dimensions Electricity 13 Expired
US6513452B2 Adjusting DC bias voltage in plasma chamber Electricity 13 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.