Patent · US Expired

Apparatus for treating substrates

US6799588B1 · kind B1 · utility

4Cited by

23References

13Claims

0Family size

Assignee

Steag Micro Tech GmbH · DE

Inventors

Ulrich Speh · Steinenbronn, DE
Jens Schneider · Bielefeld, DE
Marc Meuris · Keerbergen, BE

Key dates

Filing date	Apr 17, 2002
Grant date	Oct 5, 2004
Priority date	—
Expiry date	Dec 12, 2022

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S134/902
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

The aim of the invention is to attain a uniform and homogeneous treatment of substrates in a device comprising at least one process container which is arranged in a gas atmosphere and which contains a treatment fluid. Said process container also comprises at least two openings which are located underneath a treatment fluid surface and through which the substrates are linearly guided. In addition, an overflow for the treatment fluid is provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.