Method and structure to segment RF coupling to silicon electrode
US6806653B2 · kind B2 · utility
19Cited by
5References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2003 |
| Grant date | Oct 19, 2004 |
| Priority date | — |
| Expiry date | Jan 31, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrode assembly for use in a plasma processing system including a base electrode adapted to be coupled to a source of RF energy, a removable electrode removably coupled to the base electrode, and a material interposed between a surface of the base electrode and a surface of the removable electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.