Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber

US6807972B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Ho-Man Rodney Chiu · San Jose, US
• Eugene Smargiassi · Tualatin, US
• Steven Verhaverbeke · San Francisco, US
• Brian H. Burrows · San Jose, US

Key dates

• Filing date: Mar 29, 2002
• Grant date: Oct 26, 2004
• Expiry date: Jul 29, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S134/902
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.