Method for growing thin films by catalytic enhancement
US6811814B2 · kind B2 · utility
30Cited by
74References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 16, 2002 |
| Grant date | Nov 2, 2004 |
| Priority date | — |
| Expiry date | May 1, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45534
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of growing a thin film onto a substrate. A precursor of the film is fed into a reaction space in the form of a vapor phase pulse causing the precursor to adsorb onto the surface of the substrate to form a layer thereof. A catalyst is susequently fed into the reaction space in an amount to substantially convert the layer of the precursor to the desired thin film. The above steps may be repeated to achieve the desired film thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.