Manufacturing system method for processing a lithography mask container
US6817602B2 · kind B2 · utility
2Cited by
17References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 28, 2001 |
| Grant date | Nov 16, 2004 |
| Priority date | — |
| Expiry date | Jul 13, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70691
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An electronic device (205) is attached to a container (200) that carries a lithography mask (201) through a semiconductor factory (100) form a first station (110) to a second station (120). In the device, a receiver unit (210) receives first data (111) indicating how the first station has used the mask in a first process; a memory unit (220) temporarily stores the first data; a processor unit (230) processes the first data and provides second data (122) indicating how the second station uses the mask in a second future process; and a transmitter unit (240) transmits the second data to the second station or to a factory host.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.