Linear inductive plasma pump for process reactors
US6824363B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2002 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | Mar 3, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/54
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A plasma pump, a plasma processing system and method to pump particles from a first region containing a plasma to a second region at a higher pressure is provided. The plasma pump and the plasma processing system each include a magnetic field producing member disposed within a passageway defined by an inner wall and an outer wall. The magnetic field producing member produces an alternating magnetic field that extends generally transverse to the passageway. An electric field producing member is disposed outside of the passageway and produces an electric field in a direction generally transverse to the passageway and generally transverse to the magnetic field. In one preferred embodiment, the passageway extends vertically and in another preferred embodiment, the passageway extends horizontally.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.