Drip manifold for uniform chemical delivery
US6827793B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2003 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Sep 12, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S239/19
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for cleaning a wafer with a drip nozzle being configured for use in a drip manifold that is oriented over a brush of a wafer cleaning system is provided. The drip nozzle has a first end and a second end with a passage defined there between where the passage includes a wall that extends longitudinally between the first end and the second end. An orifice is defined within the passage and located at the first end of the drip nozzle. The method includes inputting a fluid into the drip nozzle at an acute angle relative to a longitudinal extension of the wall and reflecting the fluid stream off an internal wall of the drip nozzle at least twice in a direction that is toward the second end. The method further includes outputting at least one substantially uniform drop from the second end of the passage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.